N2/H2/O2/Ar/He/NH3/CO2/Clean Dry Air/Point Of Use 7N-9N Purification Plant
High Productivity 99.99999% Continuous Gas Supply Hydrogen Cleaning Unit for Methanol Synthesis
7N Hydrogen Purification System
The 7N Hydrogen Purification System consists of two main parts: the gas circuit and the electronic control.
The gas circuit includes multiple parallel catalyst purification units, a series of pneumatic valves, gas pipelines, and heat
exchangers. This system uses a combination of chemical reactions and physical adsorption at room temperature to remove impurities such as H2O, O2, CO2, CO, and NMHC from the process gas, reducing them to less than 5 parts per billion (ppb). It can be equipped with particle filters with a filtration precision of 0.003 microns.
The electronic control part includes a PLC (Programmable Logic Controller), temperature controllers, and a touch screen. This part manages the purification, regeneration, and safety alarm processes, ensuring the purification system operates continuously, safely, and stably.
Flow Range: 10-20,000 Nm³/h
Impurity Content in Outlet Gas: Less than 5 ppb for each impurity
Particle Filter: 0.003 μm
Purification Tank: 316L Stainless Steel
Design: Multiple purification units designed for in-situ regeneration after saturation
Operation: Fully automatic operation for continuous gas supply
| Product Model |
7N-10 |
7N-100 |
7N-3000 |
7N-10000 |
| Purifiable Gases |
H2,H2 Mixed with Inert Gases |
| Standard Flow Rate |
10Nm3/h,20Nm3/h,30Nm3/h,40Nm3/h,60Nm3/h |
100Nm3/h,150Nm3/h,200Nm3/h,300Nm3/h,400Nm3/h,600Nm3/h , 800Nm3/h, 1000Nm3/h,1500Nm3/h,2000Nm3/h |
3000Nm3/h,4000Nm3/h,6000Nm3/h, 8000Nm3/h |
10000Nm3/h,15000Nm3/h, 20000Nm3/h |
| Maximum Pressure |
1.0 |
1.0 |
1.0 |
1.0 |
| Maximum Pressure Drop |
0.1 |
0.1 |
0.1 |
0.1 |
| Particle Filter |
1 |
1 |
N/A |
N/A |
| Removed Impurities |
H2O, O2, CO2, CO,NMHC |
| Purification Performance |
<5ppb |
| 7N Hydrogen Purification System |
9N Hydrogen Purification System |
9N Hydrogen Purification System
The 9N Hydrogen Purification System consists of two main parts: the gas circuit and the electronic control.
The gas circuit includes multiple parallel catalyst purification units, a series of pneumatic valves, gas pipelines, and heat
exchangers. This system uses a combination of chemical reactions and physical adsorption at room temperature to remove impurities such as H2O, O2, CO2, CO, and NMHC from the process gas, reducing them to less than 1 part per billion (ppb). It can be equipped with particle filters with a filtration precision of 0.003 microns.
The electronic control part includes a PLC (Programmable Logic Controller), temperature controllers, and a touch screen. This part manages the purification, regeneration, and safety alarm processes, ensuring the purification system operates continuously, safely, and stably.
Flow Range: 10-20,000 Nm³/h
Impurity Content in Outlet Gas: Less than 1 ppb for each impurity
Particle Filter: 0.003 μm
Purification Tank: 316L Stainless Steel EP
Design: Multiple purification units designed for in-situ regeneration after saturation
Operation: Fully automatic operation for continuous gas supply
| Product Model |
9N-10 |
9N-100 |
9N-3000 |
9N-10000 |
| Purifiable Gases |
H2,H2 Mixed with Inert Gases |
| Standard Flow Rate |
10Nm3/h,20Nm3/h,30Nm3/h,40Nm3/h,60Nm3/h |
100Nm3/h,150Nm3/h,200Nm3/h,300Nm3/h,400Nm3/h,600Nm3/h,800Nm3/h, 1000Nm3/h,1500Nm3/h,2000Nm3/h |
3000Nm3/h,4000Nm3/h, 6000Nm3/h,8000Nm3/h |
10000Nm3/h,15000Nm3/h, 20000Nm3/h |
| Maximum Pressure |
1.0 |
1.0 |
1.0 |
1.0 |
| Maximum Pressure Drop |
0.1 |
0.1 |
0.1 |
0.1 |
| Particle Filter |
0.003 |
0.003 |
N/A |
N/A |
| Removed Impurities |
H2O, O2, CO2, CO,NMHC |
| Purification Performance |
<1ppb |
| Large-scale Integrated Circuit Manufacturing |
Semiconductor Discrete Device Manufacturing |
Large Silicon Wafer Production |
| Panel and Display Manufacturing |
Optical Fiber Preform Production |
High-efficiency Solar Cell Production |
| LED and Laser Diode Manufacturing |
Production of Ultra High Purity Gases, Mixed Gases, and Standard Gases |
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