N2/H2/O2/Ar/He/NH3/CO2/Clean Dry Air/Point Of Use 7N-9N Purification Plant
Custom Design 1Mpa EP N2 Nitrogen Purification Filter for Iron And Steel Industry
7N Inert Gas Purification System
The 7N Inert Gas Purification System consists of two main parts: the gas circuit and the electronic control. The gas circuit
includes a high-temperature catalyst purification unit, multiple parallel low-temperature catalyst purification units, a series of pneumatic valves, gas pipelines, and heat exchangers. This system combines high-temperature catalysis and low-temperature adsorption to remove impurities such as H2O, O2, CO, CO2, CH4, NMHC, and H2 from the process gas, reducing them to less than 5 parts per billion (ppb). It can be equipped with particle filters with a filtration precision of 0.003 microns.
The electronic control part includes a PLC (Programmable Logic Controller), temperature controllers, and a touch screen. This part manages the purification, regeneration, and safety alarm processes, ensuring the purification system operates continuously, safely, and stably.
Flow Range: 30-6000 Nm³/h
Impurity Levels: Less than 5 ppb for all impurities in the output gas
Methane Removal: Capable of removing methane from inert gases
Filter Option: Can be configured with 0.003-micron filters
Purification Tank Material: 316L stainless steel
Catalyst Units: One high-temperature catalyst unit and multiple low-temperature adsorption units; the initial stage does notrequire regeneration, while the later stage regenerates in situ
Operation: Fully automated and continuous gas supply
Product Model |
7N-30-I |
7N-300-I |
7N-1000-I |
Purifiable Gases |
N2, Ar He, Xe, Ne, Kr |
Standard Flow Rate |
30Nm3/h,40Nm3/h,60Nm3/h,100Nm3/h,150Nm3/h,200Nm3/h |
300Nm3/h,400Nm3/h,600Nm3/h,800Nm3/h |
1000Nm3/h,1500Nm3/h,2000Nm3/h,3000Nm3/h,4000Nm3/h,6000Nm3/h |
Maximum Pressure |
1.0 |
1.0 |
1.0 |
Maximum Pressure Drop |
0.1 |
0.1 |
0.1 |
Particle Filter |
1 |
N/A |
N/A |
Removed Impurities |
H2O, O2, CO, CO2, H2,CH4, NMHC |
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|
Purification Performance |
<5ppb |
7N Inert Gas Purification System |
9N Inert Gas Purification System |
9N Inert Gas Purification System
The 9N Inert Gas Purification System consists of two main parts: the gas circuit and the electronic control. The gas circuit
includes a high-temperature catalyst purification unit, multiple parallel low-temperature catalyst purification units, a series of pneumatic valves, gas pipelines, and heat exchangers. This system combines high-temperature catalysis and low-temperature adsorption to remove impurities such as H2O, O2, CO, CO2, CH4, NMHC, and H2 from the process gas, reducing them to less than 1 part per billion (ppb). It can be equipped with particle filters with a filtration precision of 0.003 microns.
The electronic control part includes a PLC (Programmable Logic Controller), temperature controllers, and a touch screen. This part manages the purification, regeneration, and safety alarm processes, ensuring the purification system operates continuously, safely, and stably.
Flow Range: 30-6000 Nm³/h
Impurity Levels: Less than 1 ppb for all impurities in the output gas
Methane Removal: Capable of removing methane from inert gases
Filter Option: Can be configured with 0.003-micron filters
Purification Tank Material: 316L stainless steel
Catalyst Units: One high-temperature catalyst unit and multiple low-temperature adsorption units; the initial stage does not require regeneration, while the later stage regenerates in situ
Operation: Fully automated and continuous gas supply
Product Model |
9N-30-I |
9N-300-I |
9N-1000-I |
Purifiable Gases |
N2, Ar He, Xe, Ne, Kr |
Standard Flow Rate |
30Nm3/h,40Nm3/h,60Nm3/h,100Nm3/h,150Nm3/h,200Nm3/h |
300Nm3/h,400Nm3/h,600Nm3/h,800Nm3/h |
1000Nm3/h,1500Nm3/h,2000Nm3/h,3000Nm3/h,4000Nm3/h,6000Nm3/h |
Maximum Pressure |
1.0 |
1.0 |
1.0 |
Maximum Pressure Drop |
0.1 |
0.1 |
0.1 |
Particle Filter |
0.003 |
N/A |
N/A |
Removed Impurities |
H2O, O2, CO, CO2, H2,CH4, NMHC |
|
|
Purification Performance |
<1ppb |
Large-scale Integrated Circuit Manufacturing |
Semiconductor Discrete Device Manufacturing |
Large Silicon Wafer Production |
Panel and Display Manufacturing |
Optical Fiber Preform Production |
High-efficiency Solar Cell Production |
LED and Laser Diode Manufacturing |
Production of Ultra High Purity Gases, Mixed Gases, and Standard Gases |