N2/H2/O2/Ar/He/NH3/CO2/Clean Dry Air/Point Of Use 7N-9N Purification Plant
Wholesale Ultrapure He Air Purifiers for Gas Chromatography
7N Inert Gas Purification System
The 7N Inert Gas Purification System consists of two main parts: the gas circuit and the electronic control. The gas circuit
includes a high-temperature catalyst purification unit, multiple parallel low-temperature catalyst purification units, a series of pneumatic valves, gas pipelines, and heat exchangers. This system combines high-temperature catalysis and low-temperature adsorption to remove impurities such as H2O, O2, CO, CO2, CH4, NMHC, and H2 from the process gas, reducing them to less than 5 parts per billion (ppb). It can be equipped with particle filters with a filtration precision of 0.003 microns.
The electronic control part includes a PLC (Programmable Logic Controller), temperature controllers, and a touch screen. This part manages the purification, regeneration, and safety alarm processes, ensuring the purification system operates continuously, safely, and stably.
Flow Range: 30-6000 Nm³/h
Impurity Levels: Less than 5 ppb for all impurities in the output gas
Methane Removal: Capable of removing methane from inert gases
Filter Option: Can be configured with 0.003-micron filters
Purification Tank Material: 316L stainless steel
Catalyst Units: One high-temperature catalyst unit and multiple low-temperature adsorption units; the initial stage does notrequire regeneration, while the later stage regenerates in situ
Operation: Fully automated and continuous gas supply
| Product Model |
7N-30-I |
7N-300-I |
7N-1000-I |
| Purifiable Gases |
N2, Ar He, Xe, Ne, Kr |
| Standard Flow Rate |
30Nm3/h,40Nm3/h,60Nm3/h,100Nm3/h,150Nm3/h,200Nm3/h |
300Nm3/h,400Nm3/h,600Nm3/h,800Nm3/h |
1000Nm3/h,1500Nm3/h,2000Nm3/h,3000Nm3/h,4000Nm3/h,6000Nm3/h |
| Maximum Pressure |
1.0 |
1.0 |
1.0 |
| Maximum Pressure Drop |
0.1 |
0.1 |
0.1 |
| Particle Filter |
1 |
N/A |
N/A |
| Removed Impurities |
H2O, O2, CO, CO2, H2,CH4, NMHC |
|
|
| Purification Performance |
<5ppb |
| 7N Inert Gas Purification System |
9N Inert Gas Purification System |
9N Inert Gas Purification System
The 9N Inert Gas Purification System consists of two main parts: the gas circuit and the electronic control. The gas circuit
includes a high-temperature catalyst purification unit, multiple parallel low-temperature catalyst purification units, a series of pneumatic valves, gas pipelines, and heat exchangers. This system combines high-temperature catalysis and low-temperature adsorption to remove impurities such as H2O, O2, CO, CO2, CH4, NMHC, and H2 from the process gas, reducing them to less than 1 part per billion (ppb). It can be equipped with particle filters with a filtration precision of 0.003 microns.
The electronic control part includes a PLC (Programmable Logic Controller), temperature controllers, and a touch screen. This part manages the purification, regeneration, and safety alarm processes, ensuring the purification system operates continuously, safely, and stably.
Flow Range: 30-6000 Nm³/h
Impurity Levels: Less than 1 ppb for all impurities in the output gas
Methane Removal: Capable of removing methane from inert gases
Filter Option: Can be configured with 0.003-micron filters
Purification Tank Material: 316L stainless steel
Catalyst Units: One high-temperature catalyst unit and multiple low-temperature adsorption units; the initial stage does not require regeneration, while the later stage regenerates in situ
Operation: Fully automated and continuous gas supply
| Product Model |
9N-30-I |
9N-300-I |
9N-1000-I |
| Purifiable Gases |
N2, Ar He, Xe, Ne, Kr |
| Standard Flow Rate |
30Nm3/h,40Nm3/h,60Nm3/h,100Nm3/h,150Nm3/h,200Nm3/h |
300Nm3/h,400Nm3/h,600Nm3/h,800Nm3/h |
1000Nm3/h,1500Nm3/h,2000Nm3/h,3000Nm3/h,4000Nm3/h,6000Nm3/h |
| Maximum Pressure |
1.0 |
1.0 |
1.0 |
| Maximum Pressure Drop |
0.1 |
0.1 |
0.1 |
| Particle Filter |
0.003 |
N/A |
N/A |
| Removed Impurities |
H2O, O2, CO, CO2, H2,CH4, NMHC |
|
|
| Purification Performance |
<1ppb |
| Large-scale Integrated Circuit Manufacturing |
Semiconductor Discrete Device Manufacturing |
Large Silicon Wafer Production |
| Panel and Display Manufacturing |
Optical Fiber Preform Production |
High-efficiency Solar Cell Production |
| LED and Laser Diode Manufacturing |
Production of Ultra High Purity Gases, Mixed Gases, and Standard Gases |
Audited Supplier 
){kind=link}