Lower Running Cost 99.99999% Explosion-Proof Carbon Dioxide Purification Facility for Plant Cultivation

• Customization: Available
• Application Fields: Electronic, Food
• Condition: New
• Model NO.: 10NM3/H - 20000NM3/H
• Purification technology: High-Temperature Catalysis and Room-Temperature Ad
• Product Model: Wp6-a
• Purifiable Gases: CO2
• Purification Process: Adsorption
• Gas Source Inlet: ≤1000 Ppb
• Gas Source Outlet: <1 Ppb
• Particles: 1PCS/M3 >0.003μm
• Standard Flow Rate: 10-20000nm3/H
• Transport Package: Wooden Case or Container
• Trademark: WOBO
• Origin: China
• HS Code: 8421399090
• Production Capacity: 10-20000nm3/H

Product Description

N2/H2/O2/Ar/He/NH3/CO2/Clean Dry Air/Point Of Use 7N-9N Purification Plant
Lower Running Cost 99.99999% Explosion-Proof Carbon Dioxide Purification Facility for Plant Cultivation

Product Description

7N-9N Carbon Dioxide Purification System

The CO2 purifier consists of process pipelines and electrical controls; PLC controls the operation of process valves, enabling safe and stable continuous operation.

7N-9N High-Efficiency Purification Technology
 

Dual-tower alternating adsorption, continuous gas supply
 

Adsorbents can be regenerated online repeatedly
 

316L SS EP purification vessel
 

PLC control system, fully automated operation
 

Equipped with a safety-enhanced alarm interlock function

Product Model		WP6-A	WP6-OA
Purifiable Gases		CO2
Purification Process		Adsorption	Catalysis + Adsorption
Gas Source	Inlet	Outlet	Outlet
Impurities	ppb	ppb	ppb
O2	≤1000	<1	<1
H2O	≤3000	<1	<1
CO	≤1000	<1	<1
H2	≤1000	<1	<1
CH4	≤1000	/	<1
Particles	/	≤1pcs/m3 >0.003μm	≤1pcs/m3 >0.003μm
Standard Flow Rate	10-20000Nm3/h

The WP6-A series CO2 purifier utilizes an adsorption process. The gas undergoes adsorption at room temperature to effectively remove impurities such as O2, H2O, CO, H2, NMHC, etc.

 

The WP6-OA series utilizes a process combining catalytic oxidation and adsorption. Initially, the gas undergoes catalytic oxidation to convert reducible impurities such as CH4, H2, CO, etc., into H2O and CO2 through reaction with O2. Subsequently, the gas undergoes an adsorption process to deeply remove residual impurities such as O2, H2O, NMHC, etc.

 

 

Detailed Photos

 

Applications

Large-scale Integrated Circuit Manufacturing

Semiconductor Discrete Device Manufacturing

Large Silicon Wafer Production

 

Panel and Display Manufacturing

Optical Fiber Preform Production

High-efficiency Solar Cell Production

 

LED and Laser Diode Manufacturing

Production of Ultra High Purity Gases, Mixed Gases, and Standard Gases

Certifications